Rapid and facile low-temperature solution production of ZrO2 films as high-k dielectrics for flexible low-voltage thin-film transistors

A rapid lightwave (LW) irradiation method was presented for the low-temperature solution production of ZrO₂ films as high-k dielectrics for flexible high-performance thin-film transistors (TFTs). The LW irradiation process markedly decreased the required processing temperature and processing time. Microstructure characterizations confirmed the successful formation of ZrO₂ films with an ultrasmooth surface, large band gap (>5 eV) and low defect level. The ZrO₂ film produced via LW irradiation at ∼200 °C in only 8 min presented excellent dielectric properties, including a small leakage current of 3.3 × 10⁻⁸ A/cm² and a large capacitance of 296 nF/cm², significantly outperforming the films by the conventional high-temperature annealing process at 400 °C for 60 min. Furthermore, LW irradiation was extended to the channel layer. The rapid low-temperature solution-processed InZrO_x TFTs exhibited superior electrical characteristics, such as a high carrier mobility of 41.3 cm²V⁻¹s⁻¹ and a high on-off current ratio of 10⁵∼10⁶ at a low operation voltage of 3 V due to the employment of high-quality ZrO₂ dielectric films. Moreover, the flexible TFT on a polyimide (PI) plastic substrate achieved a high mobility of nearly 30 cm²V⁻¹s⁻¹, indicating that LW irradiation is highly promising for the rapid and low-temperature solution production of high-quality and flexible oxide electronic devices.