Growth behavior of titanium dioxide thin films at different precursor temperatures |
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Authors: | Sang-Hun Nam Sang-Jin Cho Jin-Hyo Boo |
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Affiliation: | (1) Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon, 440-746, South Korea |
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Abstract: | The hydrophilic TiO2 films were successfully deposited on slide glass substrates using titanium tetraisopropoxide as a single precursor without
carriers or bubbling gases by a metal-organic chemical vapor deposition method. The TiO2 films were employed by scanning electron microscopy, Fourier transform infrared spectrometry, UV-Visible UV-Vis] spectroscopy,
X-ray diffraction, contact angle measurement, and atomic force microscopy. The temperature of the substrate was 500°C, and
the temperatures of the precursor were kept at 75°C (sample A) and 60°C (sample B) during the TiO2 film growth. The TiO2 films were characterized by contact angle measurement and UV-Vis spectroscopy. Sample B has a very low contact angle of almost
zero due to a superhydrophilic TiO2 surface, and transmittance is 76.85% at the range of 400 to 700 nm, so this condition is very optimal for hydrophilic TiO2 film deposition. However, when the temperature of the precursor is lower than 50°C or higher than 75°C, TiO2 could not be deposited on the substrate and a cloudy TiO2 film was formed due to the increase of surface roughness, respectively. |
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Keywords: | TiO2 superhydrophilic precursor temperature anatase phase growth behavior |
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