|
|||||
|
|
Copolymers of 2-hydroxyethyl methacrylate and methyl methacrylate: an electron beam resist study |
|
| Authors: | Varinder K Sharma Stanley Affrossman Richard A Pethrick |
| Affiliation: | Department of Pure and Applied Chemistry, University of Strathclyde, 295 Cathedral Street, Glasgow G1 1XL, Scotland, UK |
| Abstract: | The electron beam development characteristics of copolymers of HEMA and MMA are reported. A copolymer with 4% of HEMA was found to have comparable sensitivity and enhanced contrast compared with conventional PMMA and this material would appear to be useful in lithographic applications. |
| Keywords: | 2-hydroxyethyl methacrylate methyl methacrylate electron beam resist copolymer |
| 本文献已被 ScienceDirect 等数据库收录！ | |