银纳米线与二氧化硅衬底表面摩擦力的测量

银纳米线是制作纳米光电子器件的理想材料,了解银纳米线与特定衬底间的摩擦特性对于器件的设计和制备工艺具有重要参考价值.本文利用原子力显微镜(AFM)研究银纳米线与二氧化硅衬底表面的摩擦特性,为提高摩擦力测量准确性,依次借助斜面法和横向力曲线分别标定了AFM探针的扭转弹性常数和光杠杆横向灵敏度,同时对扫描器引入的横向误差进行了补偿.利用AFM纳米操纵技术记录了单根银纳米线由静止到整体滑动的全过程,实验测得直径50 nm银纳米线与二氧化硅衬底表面的最大静摩擦线密度和滑动摩擦线密度分别为1.07 nN/nm和0.56 nN/nm.

Measurement of the friction between a silver nanowire and the silicon dioxide substrate

Silver nanowires ( Ag NWs ) are ideal building blocks for nano?photoelectric devices. Understanding the friction mechanism between individual Ag NWs and certain substrate is of great significance to the nano?manufacturing process. In this paper, the atomic force microscopy ( AFM) is applied to study the friction between Ag NWs and silicon dioxide ( SiO2 ) substrate. By using the AFM?based nanomanipulation, an Ag NW with 50 nm in diameter is moved across the SiO2 surface. During the translation, the friction force is recorded by the AFM cantilever probe. In order to increase the accuracy of the force measurement, the lateral spring constant of the AFM cantilever and the sensitivity of optical lever are precisely calibrated by using the wedge method and the lateral force?curve method, respectively. The error introduced by the movement of the AFM scanner is also considered and compensated. The measurement results show that the maximum static friction force per unit between Ag NWs and the SiO2 substrate is 1.07 nN/nm, and the sliding friction per unit is 0.56 nN/nm.