Structural analysis of Ti-Fe thin films prepared by pulsed laser deposition

Titanium iron oxide (Ti-Fe-O) thin films have been successfully deposited by pulsed laser deposition (PLD). Experiments were carried out by using some targets. One was a Ti-50 at.% Fe-sintered target, while the others were Ti and Fe plates with various surface area ratio [S_R=S_Fe/(S_Fe+S_Ti)] from 30 to 70%. The thin films were analyzed by X-ray diffractometry, Rutherford backscattering spectroscopy (RBS) and transmission electron microscopy (TEM). From XRD analysis, the main phase in the thin films deposited at S_R=30 and 50% was β-Ti (Fe). By increasing S_R to 70%, the main phase of the thin film changed to TiFe. By phase diagram, composition of TiFe must be between Ti-47.5-50.3 at.% Fe at a temperature of 1085 °C. However, the composition of the thin film deposited at S_R=70% was found to be Ti_0.15Fe_0.62O_0.23. Thus, the composition of Fe in the thin film was much greater than the solubility limit. This fact suggests two possibilities. One is that the thin films, which we have deposited, were in a metastable state. The other is that metal oxides of amorphous state could be contained in the thin film.