| 新型室温中远波段红外探测器的关键工艺研究 |
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| 引用本文： | 杨道虹,徐晨,董典红,李兰,吴畯苗,张建铭,阳启明,邹德恕,沈光地. 新型室温中远波段红外探测器的关键工艺研究[J]. 仪表技术与传感器, 2004, 0(4): 3-4 |
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| 作者姓名： | 杨道虹 徐晨 董典红 李兰 吴畯苗 张建铭 阳启明 邹德恕 沈光地 |
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| 作者单位： | 北京工业大学电子信息与控制工程学院北京市光电子技术实验室,北京,100022 |
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| 基金项目： | 北京市教委项目(KM200310005009) |
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| 摘 要： | 介绍了一种基于MEMS技术的新型室温中远红外波段硅基电容式红外探测器原理和制作工艺过程，并详细介绍了针对单面光刻机而采用的对准孔双面对准和键合对准技术、浓硼扩散FLPW腐蚀停止技术制备超薄敏感硅膜以及薄膜的疏水处理等关键工艺。还对各环节所遇到的问题和其相应的解决方法进行了详细地阐述。
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| 关 键 词： | MEMS 红外探测器 腐蚀 键合 光刻 制作工艺 |
| 文章编号： | 1002-1841(2004)04-0003-02 |
| 修稿时间： | 2003-09-02 |
Research of Technology for Novel Uncooled Infrared Detector |
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| YANG Dao-hong,XU Chen,DONG Dian-hong,LI Lan,WU Jun-miao,ZHANG Jian-ming,YANG Qi-ming,ZOU De-shu,SHEN Guang-di. Research of Technology for Novel Uncooled Infrared Detector[J]. Instrument Technique and Sensor, 2004, 0(4): 3-4 |
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| Authors: | YANG Dao-hong XU Chen DONG Dian-hong LI Lan WU Jun-miao ZHANG Jian-ming YANG Qi-ming ZOU De-shu SHEN Guang-di |
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| Abstract: | Presented a novel uncooled infrared detector structure and its working theory.The novel uncooled infrared detector was fabricated by the technology of MEMS based on silicon technology.During presenting the device,the problems and their solutions during making process are presented.The key techniques including anodic bonding,double-face lithography and etching were also introduced in detail. |
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| Keywords: | MEMS Etching Bonding Lithography |
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