阴极电弧沉积TiN薄膜研究

对真空阴极电弧沉积TiN装饰膜的沉积工艺和膜层性能的关系进行了研究。结果表明:适当选择N_2分压和负偏压对于改善基体表面离子轰击清洗效果、减少液滴分布、保证膜层颜色和提高膜层耐蚀性至关重要。另外,X射线织构分析表明:(220)织构随负偏压加大而增加,而(111)织构则随N_2分压增大而增加,这可由离子轰击诱导织构效应解释。

A STUDY ON TIN THIN FILMS PREPARED BY VACUUM CATHODIC ARC DEPOSITION

The relations between the deposition parameters and the film properties are investigated in this paper for TiN decorative films prepared by vacuum cathodic arc edposition. The results indicate that proper selection of the N_2 partial pressure and the negative bias voltage is essential to improve the cleaning effect of ion bombardment on the substrate surface, to reduce the droplet distribution, to ensure the color of the films and to enhance the corrosion resistance of the films. The Xray texture analysis shows that the (220) texture increases as the negative bias voltage increases and the (111) texture increases as the N_2 partial pressure increases. This phenomenon can be explained by the effect of ion bombardment-induced texturing.