Computer-controlled scanning electron microscope system for high-resolution microelectronic pattern fabrication |
| |
Abstract: | A small, dedicated computer has been interfaced to a scanning electron microscope (SEM) for the purpose of generating, registering, and fabricating microelectronic device and circuit patterns with submicron dimensions. A preliminary registration accuracy of ±0.1 µm over a (950-µm)2pattern field has been demonstrated. |
| |
Keywords: | |
|
|