| 超薄Ge单晶抛光片机械强度控制技术 |
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| 引用本文： | 赵权,杨洪星,刘春香,吕菲,张伟才,王云彪.超薄Ge单晶抛光片机械强度控制技术[J].半导体技术,2010,35(8):768-771,786. |
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| 作者姓名： | 赵权 杨洪星 刘春香 吕菲 张伟才 王云彪 |
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| 作者单位： | 中国电子科技集团公司第四十六研究所,天津,300220;中国电子科技集团公司第四十六研究所,天津,300220;中国电子科技集团公司第四十六研究所,天津,300220;中国电子科技集团公司第四十六研究所,天津,300220;中国电子科技集团公司第四十六研究所,天津,300220;中国电子科技集团公司第四十六研究所,天津,300220 |
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| 摘 要： | Ge单晶衬底上制成的化合物太阳能电池,被越来越广泛地应用于空间太阳能领域,超薄Ge抛光的机械强度也越来越受到人们的关注.介绍了一种测试超薄Ge单晶抛光片机械强度的方法.研究了加工工艺对超薄Ge单晶抛光片机械强度的影响,同时指出在太阳电池用超薄Ge单晶抛光片的加工过程中,切割、研磨、磨削、化学腐蚀、抛光等工序对超薄Ge单晶抛光片的机械强度均有着不同程度的影响.研究表明,通过调整磨削砂轮砂粒粒径、化学腐蚀去除厚度和抛光速率等工艺参数,能够有效控制超薄Ge单晶抛光片的机械强度.
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| 关 键 词： | 机械强度 锗抛光片 太阳电池 损伤层 砂轮砂粒粒径 |
Control Technique for Mechanical Strength of Ultrathin Polished Ge Wafer |
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| Zhao Quan,Yang Hongxing,Liu Chunxiang,Lü Fei,Zhang Weicai,Wang Yunbiao.Control Technique for Mechanical Strength of Ultrathin Polished Ge Wafer[J].Semiconductor Technology,2010,35(8):768-771,786. |
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| Authors: | Zhao Quan Yang Hongxing Liu Chunxiang Lü Fei Zhang Weicai Wang Yunbiao |
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| Affiliation: | Zhao Quan,Yang Hongxing,Liu Chunxiang,Lü Fei,Zhang Weicai,Wang Yunbiao(The 46th Research Institute,CETC,Tianjin 300220,China) |
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| Abstract: | Compound solar cell using polished monocrystal Ge wafers as substrate is widely used in aerospace filed,and the mechanical strength of ultrathin polished Ge wafer was received increasing attention.A method is introduced to test the mechanical strength,and the effects of sawing,lapping,grinding,etching and polishing on mechanical strength are investigated.The results show that adjusting grit diameter of grinding wheel,etching thickness and polishing rate are proved to be effective ways to improve the mechani... |
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| Keywords: | mechanical strength Ge polished wafer solar cell damage layer grit diameter of grinding wheel |
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