| 电沉积组分调制合金的技术进展及工艺设计 |
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| 引用本文： | 刘凤岭,刘佑厚.电沉积组分调制合金的技术进展及工艺设计[J].电镀与精饰,2001,23(1):14-17. |
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| 作者姓名： | 刘凤岭 刘佑厚 |
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| 作者单位： | 北京航空材料研究院， 北京 100095 |
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| 摘 要： | 组分调制合金的多层膜结构中由于存在薄膜效应，界面效应，耦合效应和周期性效应而使特性增强或产生出新颖的特性，利用电化学方法可制造结构可控的组分调制合金新材料，综述了电沉积组分调制的技术进展，并分析了电解液组分，pH值，温度，搅拌速率，脉冲电位和时间等电 沉积工艺参数对多层膜组分，结构和调制波长的影响。
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| 关 键 词： | 组分调制合金 电沉积 多层模结构 新材料 |
| 文章编号： | 1001-3849(2001)01-0014-04 |
| 修稿时间： | 2000年4月29日 |
The Evolution and Technology Design for Compositionally Modulated Alloys Electrodeposition |
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| LIU Feng ling,LIU You hou.The Evolution and Technology Design for Compositionally Modulated Alloys Electrodeposition[J].Plating & Finishing,2001,23(1):14-17. |
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| Authors: | LIU Feng ling LIU You hou |
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| Abstract: | Multilayered structure of compositionally modulated alloys (CMA), in which there are thin film effect, interface effect, coupling effect and periodicity effect present, may give rise to enhanced or novel layer property. Microtructure composition and layer thickness controllable CMA new materials can be prepared by using electrochemical deposition. In this paper, technology evolution for CMA electrodeposition are reviewed. The effect of electrodeposition parameters including the electrolyte composition, pH, temperature, agitation rate, and pulse parameter on composition, microtructure, layer thickness of CMA is analyzed. |
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| Keywords: | compositionally modulated alloys electrodeposition multilayered structure new materials |
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