(1) Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka, 599-8531;(2) Department of Earth Science, Waseda University, Nishiwaseda 1-6-1, Shinjuku-ku, Tokyo, 169-8050
Abstract:
Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO2 with H2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO2 and H2O led to the formation of CH4 and CH3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.