| MoSx/MoSx-Mo纳米多层膜的制备及其环境摩擦学特性 |
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| 引用本文： | 郑晓华,居易,沈霞,王运,涂江平,何丹农.MoSx/MoSx-Mo纳米多层膜的制备及其环境摩擦学特性[J].润滑与密封,2006(7):84-86. |
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| 作者姓名： | 郑晓华 居易 沈霞 王运 涂江平 何丹农 |
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| 作者单位： | 浙江大学材料科学与工程系 浙江杭州310027(郑晓华，居易，沈霞，王运，涂江平)，上海交通大学材料科学与工程学院 上海200030(何丹农) |
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| 基金项目： | 国家高技术研究发展计划(863计划);高等学校博士学科点专项科研项目 |
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| 摘 要： | 用直流磁控溅射在钢基体上交替溅射制备了MoSx/MoSx-Mo纳米多层膜。采用划痕仪测试薄膜与基体的结合力;采用SEM和XRD分析了纳米多层膜的形貌和显微结构;在球-盘式微摩擦试验机上测试了纳米多层膜在真空和潮湿空气中的摩擦学性能。结果表明,纳米多层膜的结合力优于纯MoS2膜。随着溅射沉积气压的升高,MoSx(002)面择优取向减弱,纳米多层膜的结合力下降。溅射气压0.24 Pa沉积的纳米多层膜在真空和潮湿空气中都呈现出最低的摩擦因数和磨损率,具有优异的环境摩擦磨损特性。
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| 关 键 词： | MoSx薄膜 磁控溅射 多层膜 沉积压力 环境 |
| 文章编号： | 0254-0150(2006)7-084-3 |
| 收稿时间： | 2006-04-20 |
| 修稿时间： | 2006年4月20日 |
Preparation and Tribological Behavior of MoSx/MoSx -Mo Nanoscale Multilayer Films in Different Environments |
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| Zheng Xiaohua Jv Yi Shen Xia Wang Yun Tu Jiangping He Dannong.Preparation and Tribological Behavior of MoSx/MoSx -Mo Nanoscale Multilayer Films in Different Environments[J].Lubrication Engineering,2006(7):84-86. |
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| Authors: | Zheng Xiaohua Jv Yi Shen Xia Wang Yun Tu Jiangping He Dannong |
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| Affiliation: | 1. Department of Materials Science and Engineering,Zhejiang University, Hangzhou Zhejiang 310027 ,China; 2. College of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200030, China |
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| Abstract: | MoS_x/MoS_x-Mo nanoscale multilayer films were deposited on steel substrate alternately by D.C.magnetron sputtering at different deposition pressures.The adhesion to steel substrate was tested by scratch tester.The morphology and microstructure of the multilayer films were characterized by SEM and XRD.The tribological properties were investigated using a ball-on-disk tribometer both in vacuum and in humid air.Results show that the adhesion of the nanoscale multilayer films to steel substrate is better than that of pure MoS_2 film.With the increase of deposition pressure,the adhesion decreases and the(002) plane orientation of MoS_x is weakened.The multilayer film deposited at 0.24 Pa shows the lowest friction coefficient and wear rate both in vacuum and in humid air,and has excellent tribological performance. |
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| Keywords: | MoS_x film magnetron sputtering multilayer film deposition pressure environment |
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