| 氧化铈纳米颗粒的合成及其化学机械抛光性能 |
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| 引用本文： | 李霞章,陈杨,陈志刚,陈建清,倪超英. 氧化铈纳米颗粒的合成及其化学机械抛光性能[J]. 润滑与密封, 2006, 0(9): 106-108 |
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| 作者姓名： | 李霞章 陈杨 陈志刚 陈建清 倪超英 |
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| 作者单位： | 江苏大学材料科学与工程学院,江苏镇江,212013;江苏工业学院,江苏常州,213016;河海大学,江苏南京,210098;特拉华大学,美国纽华克,19711 |
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| 基金项目： | 江苏省自然科学基金;江苏省高技术研究发展计划项目 |
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| 摘 要： | 在醇水混合溶液中以HMT为缓释沉淀剂制备了纳米CeO2颗粒,并用TEM,SAD,XRD对其形貌和结构进行了表征,将制备的不同粒径纳米CeO2粉体配置成抛光液,对GaAs晶片进行了化学机械抛光,用AFM对其表面粗糙度进行了测量。结果表明,不同尺寸的纳米颗粒具有不同的抛光效果,随着磨料粒径的增大,表面粗糙度值随之升高。
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| 关 键 词： | 醇水溶液 纳米CeO2 化学机械抛光 磨料粒径 |
| 文章编号： | 0254-0150(2006)9-106-3 |
| 收稿时间： | 2005-10-08 |
| 修稿时间： | 2005-10-08 |
Synthesis of CeO2 Nanoparticles and its Chemical Mechanical Polishing Performance |
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| Li Xiazhang,Chen Yang,Chen Zhigang,Chen Jianqing,Ni Chaoying. Synthesis of CeO2 Nanoparticles and its Chemical Mechanical Polishing Performance[J]. Lubrication Engineering, 2006, 0(9): 106-108 |
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| Authors: | Li Xiazhang Chen Yang Chen Zhigang Chen Jianqing Ni Chaoying |
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| Affiliation: | 1. Jiangsu University, Zhenjiang Jiangsu 212013 ,China;2. Jiangsu Polytechnic University, Changzhou Jiangsu 213016, China; 3. Hohai University, Nanjing Jiangsu 210098, China ;4. University of Delaware, Newark 19711, USA |
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| Abstract: | CeO_2nanoparticles were synthesized in alcohol-water solvent with HMT as precipitator,and were characterized by TEM,SAD and XRD.The prepared powders were collocated into polishing slurry for chemical mechanical polishing of GaAs wafer,and the surface roughness was measured by AFM.It's found that various size of nanoparticles have the different polishing effect,the surface roughness of polishing surface rises with the increasing of particle size. |
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| Keywords: | alcohol-water solvent nanometer CeO_2 chemical mechanical polishing abrasive size |
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