High-performance E-mode AlGaN/GaN HEMTs |
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Authors: | Palacios T. Suh C.-S. Chakraborty A. Keller S. DenBaars S.P. Mishra U.K. |
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Affiliation: | Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA; |
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Abstract: | Enhancement-mode AlGaN/GaN high electron-mobility transistors have been fabricated with a gate length of 160 nm. The use of gate recess combined with a fluorine-based surface treatment under the gate produced devices with a threshold voltage of +0.1 V. The combination of very high transconductance (> 400 mS/mm) and low gate leakage allows unprecedented output current levels in excess of 1.2 A/mm. The small signal performance of these enhancement-mode devices shows a record current cutoff frequency (f/sub T/) of 85 GHz and a power gain cutoff frequency (f/sub max/) of 150 GHz. |
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