Assessment of techniques for characterizing the surface quality of ground silicon nitride |
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Authors: | E S Zanoria T R Watkins K Breder L Riester M Bashkansky J Reintjes J G Sun W A Ellingson P J Blau |
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Affiliation: | (1) Oak Ridge National Laboratory, P.O. Box 2008, 37831-6063 Oak Ridge, TN, USA;(2) Caterpillar Inc., PPG, 61656-1895 Peoria, IL, USA;(3) Naval Research Laboratory, 20375 Washington, DC, USA;(4) Argonne National Laboratory, 60439 Argonne, IL, USA |
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Abstract: | This study evaluates techniques used to detect and quantify the extent of surface and subsurface damage in ground silicon
nitride. Specimens of two differently ground surfaces of a hot isostatically pressed (HIP) silicon nitride, commercially designated
as GS-44, were subjected to six types of analyses, namely mechanical stylus profiling, atomic force microscopy, point-counting
analysis of fragmentation pits, la-ser-light scattering, optical gating, and grazing incidence x-ray diffraction (GIXD). The
results of these investigations are compared and discussed. The techniques providing the clearest correlations with grinding
conditions were mechanical stylus roughness, fragmentation analysis, and GIXD (residual stress conditions). Those that exhibited
some correlation but appear to require more work to develop a reliable evaluation method were laser scattering and optical
gating. Atomic force microscopy was useful, but not as a routine investigative tool for quality control in ceramic machining.
The techniques that appear to have the most near-term potential for routine use are fragmentation analysis and optical gating.
Laser-based optical scattering exhibits potential for routine application, but, more development is needed for its commercialization. |
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Keywords: | grinding silicon nitride surface characterization surface wear |
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