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氨化Si基Ga2O3/V膜制备GaN纳米线
引用本文:杨兆柱,薛成山,庄慧照,王公堂,陈金华,李 红,秦丽霞,王邹平. 氨化Si基Ga2O3/V膜制备GaN纳米线[J]. 稀有金属材料与工程, 2009, 38(3): 377-379
作者姓名:杨兆柱  薛成山  庄慧照  王公堂  陈金华  李 红  秦丽霞  王邹平
作者单位:山东师范大学,山东,济南,250014
基金项目:Key Research Program of the National Natural Science Foundation of China,国家自然科学基金 
摘    要:氨化硅基钒应变层氧化镓膜制备了大量氮化镓纳米线,X射线衍射、扫描电子显微镜和透射电子显微镜观察发现,纳米线具有十分光滑且干净的表面,其直径为20~60 nm左右,长度达到十几微米.高分辨透射电子显微镜和选区电子衍射分析结果表明,制备的氮化稼纳米线为六方纤锌矿结构.光致发光谱显示制备的氮化稼纳米线有良好的发光特性.另外,简单讨论了氮化稼纳米线的生长机制.

关 键 词:磁控溅射  氮化镓  纳米线  光致发光
收稿时间:2008-03-03

Synthesis of Large-scale GaN Nanowires by Ammoniating Ga2O3/V Films
Yang Zhaozhu,Xue Chengshan,Zhuang Huizhao,Wang Gongtang,Chen Jinhu,Li Hong,Qin Lixia and Wang Zouping. Synthesis of Large-scale GaN Nanowires by Ammoniating Ga2O3/V Films[J]. Rare Metal Materials and Engineering, 2009, 38(3): 377-379
Authors:Yang Zhaozhu  Xue Chengshan  Zhuang Huizhao  Wang Gongtang  Chen Jinhu  Li Hong  Qin Lixia  Wang Zouping
Abstract:Large-scale GaN nanowires were synthesized on Si(111) substrates through ammoniating Ga2O3/V films. The as-grown products were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results reveal that the grown GaN nanowires have a smooth and clean surface with diameters ranging from 20 nm to 60 nm and lengths of about several tens of micrometers. The results of HRTEM and selected-area electron diffraction (SAED) show that the nanowires ...
Keywords:magnetron sputtering  GaN  nanowires:photoluminescence
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