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| Pb(Zr,Ti)O3薄膜微区残余应力的X射线面探扫描分析 | |
| 引用本文： | 杨帆,费维栋,高忠民,蒋建清.Pb(Zr,Ti)O3薄膜微区残余应力的X射线面探扫描分析[J].功能材料,2007,38(7):1097-1101. |
| 作者姓名： | 杨帆 费维栋 高忠民 蒋建清 |
| 作者单位： | 1. 东南大学,材料科学与工程学院,江苏,南京,211189;哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001 2. 哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001 3. 吉林大学,化学学院,吉林,长春,130012 4. 东南大学,材料科学与工程学院,江苏,南京,211189 |
| 摘 要： | 根据在X射线二维衍射几何关系下建立的应力应变方程,提出了一种基于X射线多晶面探衍射仪系统分析射频磁控溅射制备的Pb(Zr,Ti)O3薄膜微区残余应力的测量方法,即通过基于X射线衍射圆锥形变的分析来表征薄膜的残余应力,试验结果表明薄膜所受为残余拉应力,同时利用X射线面探扫描方法评价了薄膜的残余应力分布. |
| 关 键 词： | Pb(Zr Ti)O3薄膜 X射线二维衍射 多晶面探衍射仪 残余应力 |
| 文章编号： | 1001-9731（2007）07-1097-05 |
| 修稿时间： | 2007-01-242007-04-10 |
Micro area residual stress analysis of ferroelectric films by means of XRD2 technique |
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| YANG Fan,FEI Wei-dong,GAO Zhong-min,JIANG Jian-qing.Micro area residual stress analysis of ferroelectric films by means of XRD2 technique[J].Journal of Functional Materials,2007,38(7):1097-1101. | |
| Authors: | YANG Fan FEI Wei-dong GAO Zhong-min JIANG Jian-qing |
| Affiliation: | 1.School of Materials Science and Engineering,Southeast University,Nanjing 211189,China;2.School of Materials Science and Engineering,Harbin Institute of Technology,Harbin 150001,China;3.School of Chemistry,Jilin University,Changchun 130012,China |
| Abstract: | Based on the X-ray diffractometer attached with a rectangular planar detector and long pinhole collimator,a method of residual stress measurement in micro area of radio-frequency magnetron sputtering Pb(Zr,Ti)O3 film deposited on Pt/Ti/SiO2/Si substrate was proposed,that is,the characterization of residual stress in film was investigated according to analysis on the deformation of diffraction core.The stress measurement results showed that PZT film deposited on Pt/Si substrate is in tension,and a residual stress distribution with fluctuation was found in the film. |
| Keywords: | Pb(Zr Ti)O3 film two dimensional diffraction XRD2 residual stress |
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