On the calculation of gate tunneling currents in ultra-thin metal–insulator–semiconductor capacitors |
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Authors: | W. Magnus W. Schoenmaker |
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Affiliation: | TCAD Group, IMEC, Silicon Technology and Device Integration Division, Kapeldreef 75, B-3001 Leuven, Flanders, Belgium |
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Abstract: | The calculation of gate tunneling currents in metal–insulator–semiconductor structures with ultra-thin gate stacks directly relies on quantum mechanical principles. In this paper, it is illustrated that well-known techniques based on elementary quantum physics and statistical mechanics can successfully be applied to solve some conceptual problems encountered on calculating the gate current and the charge distribution. |
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