| 环境友好硅锰薄膜结构及性能研究进展 |
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| 引用本文： | 范裹,谢泉. 环境友好硅锰薄膜结构及性能研究进展[J]. 纳米科技, 2011, 0(5): 66-72 |
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| 作者姓名： | 范裹 谢泉 |
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| 作者单位： | 贵州大学理学院新型光电子材料与技术研究所,贵州贵阳550025 |
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| 基金项目： | 国家自然科学基金项目（60766002）,科技部国际合作专项项目（2008DFA52210） |
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| 摘 要： | 锰硅化物结构的研究对性能的提高至关重要。但锰硅化物相结构的复杂性、无公度性、组分多样且不可控性,使得近年来对其研究结论各异,从而导致热电性能的提高面临着巨大挑战。文章对锰硅化物的结构及性能优化等方面的研究进行了综述,为今后硅锰热电材料性能的提高提供一定的理论参考。
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| 关 键 词： | 高锰硅 薄膜 热电性能 能带结构 |
Research Progress on Structure and Performance of Environmentally Friendly Manganese Silicide Thin Film |
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| FAN Xiang,XIE Quan. Research Progress on Structure and Performance of Environmentally Friendly Manganese Silicide Thin Film[J]. , 2011, 0(5): 66-72 |
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| Authors: | FAN Xiang XIE Quan |
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| Affiliation: | (Institute of Advanced Optoeleetronic Material and Technology, Guizhou University, Guiyang 550025, China) |
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| Abstract: | Research of manganese silicide structure is crucial for improving performance. However,because of the complexity, incommensurability, diversity and nncontrollability of manganese silicide structure, the studies related are not uniform, the improvement of thermoelectric performance is facing enormous challenge. Some recent research developments on the structure and performance optimization of the manganese silicide compounds are reviewed. These present results provide theoretical reference for the improvement of thermoelectric performance of manganese silicide materials. |
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| Keywords: | higher manganese silicide thin film thermoelectric performance energy band structure |
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