Temperature dependence of absorption edge in MOCVD grown GaN |
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Authors: | Abdul Majid Akbar Ali Jianjun Zhu |
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Affiliation: | (1) Advance Materials Physics Lab, Department of Physics, Quaid-i-Azam university, Islamabad, Pakistan;(2) State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors CAS, P. O. Box 912, Beijing, 100083, China |
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Abstract: | We have studied the temperature dependence of absorption edge of GaN thin films grown on sapphire substrate by metal-organic chemical vapor deposition using optical absorption spectroscopy. A shift in absorption edge of about 55 meV has been observed in temperature range 273–343 K. We have proposed a theoretical model to find the energy gap from absorption coefficient using α = αmax + (αmin − αmax)/[1 + exp 2(E − Eg + KT)/KT]. Temperature dependence of band gap has also been studied by finding an appropriate theoretical fit to our data using Eg(T) = Eg(273 K) − (8.8 × 10−4T2)/(483 + T) + 0.088 (Varshni empirical formula) and Eg(T) = Eg(273 K)−0.231447/[exp(362/T)−1] + 0.082 relations. It has been found that data can be fitted accurately after adding a factor ∼0.08 in above equations. Debye temperature (483 K) and Einstein temperature (362 K) in the respective equations are found mutually in good agreement. |
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