磁镜场在直接耦合式微波等离子体CVD金刚石膜装置中的应用

在自行设计的直接耦合石英管式微波等离子体化学气相沉积（Chemical Vapor Deposition,CVD）金刚石膜装置的石英管反应腔加上磁镜场来约束等离子体,使等离子体球成为“碟盘”状,提高了等离子体球的密度,在基本参数为反应压力2.5kPa、基片温度450℃、Ar、CH4、H2气体流量分别为40sccm、4sccm、60sccm,则沉积面积可由30mm增长到50mm,沉积速率由3.3μm/h增长到3.8μm/h,反射电流由15μA减小到5μA。从而大大减少了薄膜在石英管壁和观察窗上的沉积,更好地利用微波能量,有效利用电离的活性基团沉积出高质量的金刚石薄膜。

APPLICATION OF MAGNETIC MIRROR IN DIRECT COUPLER MPCVD DIAMOND FILMS DEVICE

In the direct coupled Microwave Plasma Chemical Vapor Deposition （MPCVD） diamond film device, magnetic mirror is used upon quartz tube reaction chamber lens to better constraint shape of plasma ball. So plasma ball become to＂dish plate＂. The density of plasma ball is improved. The basic parameters ： 2.5 kPa,450 ~C, Ar 40 sccm, CH4 4 sccm, H2 60 sccm, which is constant, the diameter sedimentary area of growth from 30 mm to 50 ram, deposition rate increased from 3.3 μm/h to 3.8 μm/h,the maximum reflected electric current reduced from 15 A to 5 μA.Thus, deposition of the wall of quartz and the watching window is reduced greatly.And, the microwave energy is used effectively to made high quality diamond films or diamond like carbon filmss.