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Hydrothermal growth of V2O5 photoactive films at low temperatures
Authors:D. Vernardou  E. Spanakis  G. Kenanakis  E. Koudoumas  N. Katsarakis
Affiliation:1. Center of Materials Technology and Laser, School of Applied Technology, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece;2. Science Department, School of Applied Technology, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece;3. Department of Materials Science and Technology, University of Crete, 710 03 Heraklion, Crete, Greece;4. Institute of Electronic Structure and Laser, Foundation for Research & Technology-Hellas, P.O. Box 1527, Vassilika Vouton, 711 10 Heraklion, Crete, Greece;5. Electrical Engineering Department, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece
Abstract:It is shown that the surface morphology and the photoactivity of hydrothermally grown V2O5 films at 95 °C are greatly affected by the deposition time. Well-defined phase of V2O5 films grown for a deposition period of 2 h were found to exhibit significant photocatalytic activity, degrading stearic acid by 57%. The films presented a relatively porous structure, appearing as a wall-like network. The correlation of deposition period with the structure, morphology and the photoinduced properties of the materials are discussed.
Keywords:Oxides   Chemical synthesis   Surface properties
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