| 金属诱导非晶硅薄膜低温晶化 |
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| 引用本文： | 饶瑞,徐重阳,曾祥斌,王长安,周雪梅,赵伯芳.金属诱导非晶硅薄膜低温晶化[J].电子元件与材料,2000,19(4):24-25. |
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| 作者姓名： | 饶瑞 徐重阳 曾祥斌 王长安 周雪梅 赵伯芳 |
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| 作者单位： | 华中科技大学,电子科学与技术系,湖北,武汉,430074 |
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| 摘 要： | 介绍了一种非晶硅 (a- Si)薄膜低温晶化的新工艺 :金属诱导非晶硅薄膜低温晶化。研究了各种 a- Si/金属双层膜退火后的晶化情况。利用 X射线衍射分析了结晶硅膜的结构 ,通过光学显微镜观察了 Al诱导 a- Si薄膜晶化后的表面形貌 ,并初步探讨了金属诱导非晶硅薄膜低温晶化的机理
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| 关 键 词： | 金属诱导 非晶硅薄膜 低温晶化 |
Study on Metal Induced Crystallization of Amorphous Silicon Thin Films at Low Temperature |
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| RAO Rui,XU Zhong-yang,ZENG Xiang-bin,WANG Chang-an,ZHOU Xue-mei,ZHAO Bo-fang.Study on Metal Induced Crystallization of Amorphous Silicon Thin Films at Low Temperature[J].Electronic Components & Materials,2000,19(4):24-25. |
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| Authors: | RAO Rui XU Zhong-yang ZENG Xiang-bin WANG Chang-an ZHOU Xue-mei ZHAO Bo-fang |
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| Abstract: | Developed is new process for crystallization of amorphous silicon films by metal induced crystallization of amorphous silicon films at low temperature. Crystallization of different a Si/metal films is investigated after annealing. The structure of the thin films of crystalline silicon is analyzed by X ray diffraction. The surface of the Al induced samples is observed by optical microscopy. The mechanism of metal induced crystallization at low temperature is discussed. (5 refs.) |
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| Keywords: | metal inducing amorphous silicon films low temperature crystallization |
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