Study of air oxidation of amorphous Zr65Cu17.5Ni10Al7.5 by X-ray photoelectron spectroscopy (XPS) |
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| Authors: | A. Dhawan V. Zaporojtchenko F. Faupel S. K. Sharma |
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| Affiliation: | (1) Department of Physics, Malaviya National Institute of Technology, Jaipur, 302 017, India;(2) Faculty of Engineering, University of Kiel, Kaiserstr. 2, 24143 Kiel, Germany;(3) Present address: Department of Physics, Jagannath Gupta Institute of Engineering & Technology, Jaipur, 302 022, India |
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| Abstract: | The oxidation of the bulk amorphous alloy Zr65Cu17.5Ni10Al7.5 in air in its amorphous and the supercooled liquid states was studied in the temperature range 573–663 K using X-ray photoelectron spectroscopy (XPS). The oxide film mainly consisted of the oxides of Zr (as ZrO2) and Al (as Al2O3). No Cu or Ni was found in the oxide film formed on the amorphous state of the alloy while significant Cu (as CuO) was present in the oxide film formed on the alloy in its supercooled liquid state. The role of the various alloying elements during oxidation at high temperatures in air is discussed in the paper. The XPS data from oxide film support the previously suggested mechanism for oxidation of this alloy, i.e. the rate controlling process during oxidation of the alloy at low temperatures (in the amorphous state) is the back-diffusion of Ni and Cu, while the oxidation at high temperatures (in the supercooled liquid state) is dominated by the inward diffusion of oxygen. |
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