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Oxygen atom density in capacitively coupled RF oxygen plasma
Authors:Tjasa Vrlinic  Caroline Mille  Fabienne Poncin-Epaillard
Affiliation:a Laboratoire Polymères, Colloïdes et Interfaces, UMR CNRS 6120, Université du Maine, Avenue O. Messiaen, 72085 Le Mans, France
b Plasma Laboratory, Jozef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia
Abstract:The density of neutral oxygen atoms was determined in a plasma reactor for surface functionalization of polymer materials. Plasma was created in a stainless steel chamber by capacitively coupled RF generator at 13.56 MHz and adjustable forward power up to 100 W. Measurements were performed with a classical nickel catalytic probe. Systematic measurements were performed at a constant pumping speed, different flow rates from 15 to 100 sccm corresponding to pressures between 30 and 110 Pa, different powers between 40 and 100 W and different probe positions in the discharge chamber. The results showed that the O atom density did not depend much on probe position as long as it was between the powered electrode and grounded housing facing the electrode. The O density depended rather linearly with power at fixed pressure. At low power, the O density did not depend much on pressure, but at high power, it was increasing with increasing pressure. The O density was of the order of 1019 m−3 and increased slightly over 1020 m−3 at the highest power and pressure. The results were explained by gas phase and surface reactions.
Keywords:Oxygen density   Catalytic probe   Plasma functionalization   Polymer
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