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Photocatalytic activity of TiO2 thin films deposited by RF magnetron sputtering |
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| Authors: | Fanming Meng Xueping Song Zhaoqi Sun |
| Affiliation: | a School of Physics and Materials Science, Anhui University, 3 Feixi Road, Hefei 230039, PR China b State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, PR China c Anhui Key Laboratory of Information Materials and Devices, Anhui University, Hefei 230039, PR China |
| Abstract: | Nano-TiO2 thin films were deposited on silicon and glass substrates by radio-frequency (RF) magnetron sputtering using TiO2 ceramic target and characterized by X-ray diffractometer, X-ray photoelectron spectrometer, atomic force microscope, and ultraviolet-visible spectrophotometer. Photocatalytic activity was evaluated by light induced degradation of 5 ppm methyl orange solution using a high pressure mercury lamp as lamp-house. It was found that the film as deposited is polymorph, with energy gap of 3.02 eV, and can absorb visible light. The film was repeatedly used for six times in degradation of 5 ppm methyl orange, and the degradation rates of methyl orange solution are 36.566%, 33.112%, 32.824%, 32.248%, 30.521% and 28.794%, respectively. After ultrasonic treatment in de-ionized water for ten minutes, the degradation rate of methyl orange solution resumes to 33.975%. |
| Keywords: | TiO2 thin film Photocatalytic activity Energy gap RF magnetron sputtering Methyl orange |
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