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Femtosecond near-field scanning optical microscopy
Authors:B A Nechay  U Siegner  M Achermann  F Morier-Genaud  A Schertel  & U Keller
Affiliation:Swiss Federal Institute of Technology Zurich, Institute of Quantum Electronics, ETH Hönggerberg ? HPT, CH-8093 Zürich, Switzerland,;Micrion GmbH, Kirchenstr. 2, 85622 Feldkirchen, Germany
Abstract:We have developed an instrument for optically measuring carrier dynamics in thin-film materials with ≈150 nm lateral resolution, ≈250 fs temporal resolution and high sensitivity. This is accomplished by combining an ultrafast pump–probe laser spectroscopic technique with a near-field scanning optical microscope. A diffraction-limited pump and near-field probe configuration is used, with a novel detection system that allows for either two-colour or degenerate pump and probe photon energies, permitting greater measurement flexibility than that reported in earlier published work. The capabilities of this instrument are proven through near-field degenerate pump–probe studies of carrier dynamics in GaAs/AlGaAs single quantum well samples locally patterned by focused ion beam (FIB) implantation. We find that lateral carrier diffusion across the nanometre-scale FIB pattern plays a significant role in the decay of the excited carriers within ≈1 μm of the implanted stripes, an effect which could not have been resolved with a far-field system.
Keywords:Near-field optics  semiconductors  ultrafast spectroscopy  
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