硫酸盐体系三价铬电镀装饰铬的突破

回顾了三价铬电镀的发展历程,制定了硫酸盐体系三价铬电镀的新工艺。采用新工艺镀铬速度增加到0.057μm/min-0.077μm/min,并且速度不随时间而变化,取得了突破性的进展。镀液性能稳定,操作简单,便于维护。镀层质量优良,色泽美观,厚度能够达到0.3μm以上。中性盐雾实验,恒定湿热实验,人造汗液测试,抗化学品污染测试均能满足行业标准的要求。研究表明,新型三价铬电镀工艺具有明显的优越性,能够更好地满足广大客户的要求。

Breakthrough in Decorative Trivalent Chromium Plating of Sulphate System

Development course of trivalent chromium plating was reviewed and new technology of sulphate trivalent chromium plating was established. Using the new technology, chromium plating rates increase to from 0.055 to 0.075 μm/min, and the rates do not vary with electroplating time, which achieve a new breakthrough. The chromium plating solution is stable, operation simple, and control easy. The chromium coating quality is excellent, color beautiful and thickness can exceeds 0.3 μm. Salt spray testing (NNS), basic environmental testing (damp heat, steady state), synthetic sweat testing, and chemical pollution resistance testing all meet the needs of the standards. Researches showed that the new technology of trivalent chromium plating has obvious superiority to others and can satisfy requirement of more buyer.