| X射线成像光学的新进展:Bragg－Fresnel多层膜元件 |
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| 引用本文： | 乐孜纯 王占山. X射线成像光学的新进展:Bragg－Fresnel多层膜元件[J]. 光学精密工程, 1996, 4(2): 1-6 |
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| 作者姓名： | 乐孜纯 王占山 |
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| 作者单位： | 中国科学院长春光学精密机械研究所, 应用光学国家重点实验室, 长春130022 |
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| 摘 要： | 简要叙述了X射线反射式衍射光学元件──Bragg-Fresnel多层膜元件产生和发展的过程.介绍了它的基本原理及它的设计和制作步骤.对其应用前景作了简要分析,并对开展这方面的研究工作提出了一些设想.
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| 关 键 词： | 多层膜 刻蚀 Bragg反射 Fresnel衍射 |
| 收稿时间： | 1995-08-24 |
A New Opportunity at X-Ray Optics:Bragg-Fresnel Multilayer Elements |
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| Le Zichun,Wang Zhanshan,Ma Yueying. A New Opportunity at X-Ray Optics:Bragg-Fresnel Multilayer Elements[J]. Optics and Precision Engineering, 1996, 4(2): 1-6 |
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| Authors: | Le Zichun Wang Zhanshan Ma Yueying |
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| Affiliation: | The State Key Laboratory of Applied Optics, Changchun. Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Changchun 130022 |
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| Abstract: | This puper discribes the so-called Bragg-Fresnel structure which combines the Braggreflection of multilayer with Fresnel diffraction of zone plate. In soft X-ray wavelengthregion such structures have both high reflectance and spatial resolution, it might beemployed, therefore, as imaging and/or dispersing elements in optical systems. Themethods of design and manufacture are briefly introduced with an essential research project. |
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| Keywords: | Multilayer Etching Bragg reflection on the multilayer Fresnel diffracting effect |
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