| 新型全息记录软片DC─TAC的光化学刻蚀特性 |
| |
| 引用本文： | 周兰,余立法,朱建华,郭履容,汪国平. 新型全息记录软片DC─TAC的光化学刻蚀特性[J]. 光电工程, 1994, 0(4) |
| |
| 作者姓名： | 周兰 余立法 朱建华 郭履容 汪国平 |
| |
| 作者单位： | 四川教育学院物理系，四川大学信息光学研究所 |
| |
| 摘 要： | 报导一种新型全息记录材料（ＤＣ─ＴＡＣ）的光化学刻蚀特性，给出了刻蚀深度对曝光量以及对显影时间的依赖关系，还讨论了刻蚀过程中图形传递的失真度问题。指出了ＤＣ─ＴＡＣ作为微光学元件光刻材料的重要应用前景。
|
| 关 键 词： | 全息胶片，蚀刻，光刻材料 |
The Photochemical Etching Property of a New Holographic Recording Material:Dichromated Cellulose Triacetate |
| |
| Zhou Lan,Yu Lifa. The Photochemical Etching Property of a New Holographic Recording Material:Dichromated Cellulose Triacetate[J]. Opto-Electronic Engineering, 1994, 0(4) |
| |
| Authors: | Zhou Lan Yu Lifa |
| |
| Abstract: | This paper reports photochemical etching property of dichromated cellulose triacetate (DC-TAC),a new holographic recording material;The curves of etched depth depending on exposure and development times are given. The distortion of profiles transfer in the processing is also discussed. The paper points out that there is a good prospect in using DC-TAC as photoetching material of micro-optical elements. |
| |
| Keywords: | Holographic films Etching Photolithographic materials. |
| 本文献已被 CNKI 等数据库收录！ |
|
