| 电化学腐蚀自停止制备Si膜的新技术 |
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| 引用本文： | 张佐兰. 电化学腐蚀自停止制备Si膜的新技术[J]. 材料研究学报, 1990, 4(6): 530-533 |
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| 作者姓名： | 张佐兰 |
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| 作者单位： | 东南大学 |
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| 摘 要： | 本文介绍高精度控制 Si 膜厚度的电化学腐蚀自停止新技术。讨论光照和电极欧姆接触等对腐蚀特性的影响,以及所得 Si 膜的质量。
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| 关 键 词： | 电化学腐蚀 腐蚀自停止 薄膜 sol材料 |
| 收稿时间： | 1990-12-25 |
| 修稿时间： | 1990-12-25 |
NOVEL TECHNIQUE OF PROCESSING SILICON MEMBRANE FOR ELECTROCHEMICAL ETCH-STOP |
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| ZHANG Zuolan. NOVEL TECHNIQUE OF PROCESSING SILICON MEMBRANE FOR ELECTROCHEMICAL ETCH-STOP[J]. Chinese Journal of Materials Research, 1990, 4(6): 530-533 |
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| Authors: | ZHANG Zuolan |
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| Affiliation: | Southeast University |
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| Abstract: | Novel technique of electrochemical etch-stop for high-precision thicknesscontrol of silicon membrane was presented in this paper.The influences of light irradiationand ohm contact of electrode on etch characterization were discussed.Quality of the siliconmembranes were reported. |
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| Keywords: | electrochemical etch etch-stop membrane sol material |
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