电子束静电折板偏转系统研究

以SDS-3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。导出了折板静电偏转灵敏度与电位分布之间的关系，给出静电偏转像差方程及像差系数。用矢量描写电子轨迹，以积分式表示像差系数，给出了折板结构方程与参量。像差系数适应计算机辅助运算。结果表明，折板结构静电偏完成的图像像差明显优于原直板结构静电偏。提供了静电折板偏转与直板偏转的相关计算数据及摩尔栅条纹图。

Studies on Electrostatic Deflection of Folded Plate for E-beam Lithography Machine

Based on the SDS-3 E-beam lithography machine,the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.The requirements that the electron trajectories and potential distribution must realize for electrostatic deflection of folded plate sturcture were discussed.The relationship between electrostatic deflection of folded plate sensitivity and potential distribution along axis was also derived.The aberration equations and aberration coefficients of electrostatic deflection were given.The electron trajectories and parameters were described in the vector form,the aberrations and structure equation were described in the integral form.Aberration coefficients are appropriate for computer aided design.Superior to the electrostatic deflection of the old plate,folded one is used in aberration.Finally,calculative data and More stripe patterns of the folded plate and plate were given.