Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition |
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| Authors: | Ai-Huei Chiou Yu-Ming Chang Wen-Fa Wu Chang-Ping Chou Chun-Yao Hsu |
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| Affiliation: | (1) Department of Mechanical Engineering, National Chiao Tung University, Hsinchu, Taiwan, ROC;(2) Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, Taoyuan, Taiwan, ROC;(3) National Nano Device Laboratories, Hsinchu, Taiwan, ROC;(4) Department of Mechanical Engineering, Lunghwa University of Science and Technology, Kueishan, Taiwan, ROC; |
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| Abstract: | Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2 −) or amino (NH−) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic. |
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