| 100nm线宽的掩模硅片自动对准算法 |
| |
| 引用本文： | 梁友生,周金梅,曹益平,邢廷文.100nm线宽的掩模硅片自动对准算法[J].电子工业专用设备,2004,33(9):63-67. |
| |
| 作者姓名： | 梁友生 周金梅 曹益平 邢廷文 |
| |
| 作者单位： | 四川大学光电科学技术系,四川,成都,610064;中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川,成都,610209 |
| |
| 摘 要： | 对100nm线宽尺寸建立了掩模硅片自动对准数学模型,应用于同轴加离轴对准系统的硅片模型、掩模模型以及工件台模型中,该对准算法模型有一定可行性,能很好地满足100nm线宽对准精度的要求。
|
| 关 键 词： | 掩模硅片 对准 对准模型 坐标阵列 最小二乘法 |
| 文章编号： | 1004-4507(2004)09-0063-05 |
| 修稿时间： | 2004年7月22日 |
An Automatic Alignment Algorithm for 100 nm CD Reticle-Wafer |
| |
| LIANG YOU-sheng,ZHOU Jin-mei,CAO Yi-ping,XING Ting-wen.An Automatic Alignment Algorithm for 100 nm CD Reticle-Wafer[J].Equipment for Electronic Products Marufacturing,2004,33(9):63-67. |
| |
| Authors: | LIANG YOU-sheng ZHOU Jin-mei CAO Yi-ping XING Ting-wen |
| |
| Affiliation: | LIANG YOU-sheng1,ZHOU Jin-mei2,CAO Yi-ping1,XING Ting-wen2 |
| |
| Abstract: | In this paper the model of an automatic alignment algorithm for 100nm CD reticle-wafer was constructed .It has been applied in wafer,reticle , workpiece flat alignment model in co-axis & off-axis alignment system ,the automatic alignment algorithm is better feasible and precision is satisfied the request for 100 nm microlithography. |
| |
| Keywords: | Reticle-wafer Alignment Alignment model Coordinate array Least square method |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
