Design and simulation of high-performance lateral bipolar junction transistor on partial buried oxide

In this work, we propose a new structure of a lateral bipolar junction transistor (LAT-BJT) on partial buried oxide (PBOX). The novelty of the proposed LAT-BJT device is the use of PBOX, covering just base and emitter regions only. A two-dimensional (2D) calibrated simulation study of the proposed LAT-BJT device has shown that the proposed LAT-BJT on PBOX’s performance is unique when the PBOX is just covering base and emitter regions. At this length of PBOX, a sharp enhancement in cut-off frequency (f_T) (~10 times higher) is achieved in the proposed LAT-BJT on PBOX in comparison to an LAT-BJT on silicon-on-insulator (SOI). The breakdown voltage of the proposed LAT-BJT on PBOX is double than that of the LAT-BJT on SOI device at this PBOX length. A notable enhancement in current gain (β) is observed in the proposed LAT-BJT on PBOX in comparison to the LAT-BJT on bulk device. To check the performance of the proposed LAT-BJT on PBOX at the circuit level, two inverters have been designed and simulated using the mixed-mode simulations of Atlas simulator. It has been observed that the proposed LAT-BJT on PBOX significantly outperforms the conventional LAT-BJT device in switching performance. A notable improvement of 32% in ON delay and 72.9% in OFF delay is obtained in the proposed LAT-BJT on PBOX device in comparison to the conventional LAT-BJT device.