Electrical characteristics of high quality La2O3 gate dielectric with equivalent oxide thickness of 5 Å |
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Authors: | Wu Y.H. Yang M.Y. Chin A. Chen W.J. Kwei C.M. |
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Affiliation: | Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu; |
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Abstract: | Electrical and reliability properties of ultrathin La2O 3 gate dielectric have been investigated. The measured capacitance of 33 Å La2O3 gate dielectric is 7.2 μF/cm2 that gives an effective K value of 27 and an equivalent oxide thickness of 4.8 Å. Good dielectric integrity is evidenced from the low leakage current density of 0.06 A/cm2 at -1 V, high effective breakdown field of 13.5 MV/cm, low interface-trap density of 3×1010 eV-1/cm2, and excellent reliability with more than 10 years lifetime even at 2 V bias. In addition to high K, these dielectric properties are very close to conventional thermal SiO2 |
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