Influence of nitrogen plasma post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition |
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Authors: | Shinn-Shyong Tzeng Yang-Li Fang Ya-Ko Chih Yi-Ching Lin Chin-Fen Tuan |
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Affiliation: | 1. Department of Materials Engineering, Tatung University, 7-1 Teh-Hui Street, Taipei 104, Taiwan;2. Center for Measurement Standards (CMS), Industrial Technology Research Institute (ITRI), Hsinchu 300, Taiwan |
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Abstract: | DLC films were synthesized by RF plasma enhanced chemical vapor deposition and the effects of nitrogen plasma post-treatment at different pressures on the structure and properties of DLC films were investigated. Higher roughness was obtained after plasma post-treatment at higher pressures (0.3 and 0.9 torr) and plasma post-treatment at a lower pressure (0.15 torr) resulted in lower roughness than that of original films. The hardness of DLC films decreased with the decrease of post-treatment pressure, which is consistent with the Raman results of ID/IG ratio and G peak position. Compared to the original DLC film, the residual stress after plasma post-treatment decreased slightly due to the relatively thin region involved in the plasma post-treatment. |
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