| PREPARATION OF NANO-CRYSTALLINE Fe-Cu THIN FILMS AND THEIR MAGNETIC PROPERTIES |
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| 作者姓名： | X.F. Bi S.K. Gong H.B. Xu K.I |
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| 作者单位： | X.F. Bi，S.K. Gong，H.B. Xu and K.I. Department of Materials Science and Engineering，Beijing University of Aeronautics and Astronautics，Beijing 100083，China Research Institute of Electrical Communication，Tohoku University，Japan |
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| 基金项目： | This research is sponsored by the National Natural Science Foundation of China (Grant No.69971006). |
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| 摘 要： | Fe-Cu thin films of 0.2μm in thickness with different Cu contents were prepared by using r.f. magnetron sputtering onto glass substrate. The effect of sputtering param-eters, including Ar gas pressure and input rf power, on the structure and magnetic properties was investigated. It was found that when the power is lower than 70 W, the structure of the films remained single bcc-Fe phase with Cu solubility of up to 50at.%. TEM observations for the bcc-Fe phase showed that the grain size was in the nanometer range of less than 20nm. The coercivity of Fe-Cu films was largely affected by not only Ar gas pressure but also rf power, and reached about 2.5Oe in the pressure of 0.67-6.67Pa and in the power of less than WOW. In addition, saturation magnetization, with Cu content less than 60at. %, was about proportional to the con-tent of bcc-Fe. When Cu content was at 60at.%, however, saturation magnetization was much smaller than its calculation value.
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| 收稿时间： | 2001-07-31 |
| 修稿时间： | 2001-10-13 |
PREPARATION OF NANO-CRYSTALLINE Fe-Cu THIN FILMS AND THEIR MAGNETIC PROPERTIES |
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| X.F. Bi
,S.K. Gong
, H.B. Xu
,K.I.PREPARATION OF NANO-CRYSTALLINE Fe-Cu THIN FILMS AND THEIR MAGNETIC PROPERTIES[J].Acta Metallurgica Sinica(English Letters),2002,15(1):109-112. |
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| Authors: | XFBi SKGong HBXu KIArai |
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| Affiliation: | 1. Department of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics,Beijing 100083, China
2. Research Institute of Electrical Communication, Tohoku University, Japan |
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| Abstract: | Fe-Cu thin films of 0.2μm in thickness with different Cu contents were prepared byusing r.f. magnetron sputtering onto glass substrate. The effect of sputtering param-eters, including Ar gas pressure and input rf power, on the structure and magneticproperties was investigated. It was found that when the power is lower than 70W,the structure of the films remained single bcc-Fe phase with Cu solubility of up to50at.%. TEM observations for the bcc-Fe phase showed that the grain size was inthe nanometer range of less than 20nm. The coercivity of Fe-Cu films was largelyaffected by not only Ar gas pressure but also rf power, and reached about 2.5Oe in thepressure of 0.67-6.67Pa and in the power of less than 100W. In addition, saturationmagnetization, with Cu content less than 60at.%, was about proportional to the con-tent of bcc-Fe. When Cu content was at 60at.%, however, saturation magnetizationwas much smaller than its calculation value. |
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| Keywords: | Fe-Cu thin film magnetic property sputtering condition nano-crystalline |
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