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Particle Deposition and Removal of Relevance to Wet Processing in Semiconductor Manufacturing
Authors:Chieh-Chun Chiang  Bing Wu  Srini Raghavan
Affiliation:1. Department of Materials Science and Engineering, University of Arizona, Tucson, AZ, USAchwen6411@email.arizona.edu;3. Department of Chemical and Environmental Engineering, University of Arizona, Tucson, AZ, USA;4. Department of Materials Science and Engineering, University of Arizona, Tucson, AZ, USA;5. Department of Chemical and Environmental Engineering, University of Arizona, Tucson, AZ, USA
Abstract:
Keywords:megasonic cleaning  particle deposition  particle removal  wet processing of wafers
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