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成像器件紫外增强薄膜技术研究进展
引用本文:田鑫,张大伟,黄元申,倪争技,庄松林.成像器件紫外增强薄膜技术研究进展[J].四川激光,2008,29(5).
作者姓名:田鑫  张大伟  黄元申  倪争技  庄松林
作者单位:上海理工大学光电学院
基金项目:国家科技部支撑计划,上海市科委资助项目,上海市教委资助项目
摘    要:简述了用于成像器件紫外增强方面的薄膜技术研究进展。讨论了成像器件对紫外响应弱的原因,介绍了紫外增强的方案。重点介绍了有机和无机两类变频膜的材料、制备方法和性能。

关 键 词:成像  薄膜  紫外

Research progress in thin-film technology applied in UV-enhanced image sensors
TIAN Xin,ZHANG Da-wei,HUANG Yuan-shen,NI Zheng-ji,ZHUANG Song-lin.Research progress in thin-film technology applied in UV-enhanced image sensors[J].Laser Journal,2008,29(5).
Authors:TIAN Xin  ZHANG Da-wei  HUANG Yuan-shen  NI Zheng-ji  ZHUANG Song-lin
Abstract:The research progress in thin-film technology applied in UV-enhanced image sensors was summarized in this paper.The reason why typical image sensors had poor responsivity in the ultraviolet(UV) region of the spectrum was given.Some methods to improve the UV responsivity were introduced here,including the preparation ways and the performance of films.
Keywords:image  thin-film  ultraviolet
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