| 向生产价值的30nm光刻协合渐进 |
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| 引用本文： | Daniel R.Cote,James A.Mc Clay,Noreen Harned,童志义. 向生产价值的30nm光刻协合渐进[J]. 电子工业专用设备, 2000, 29(3): 44-52 |
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| 作者姓名： | Daniel R.Cote James A.Mc Clay Noreen Harned 童志义 |
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| 作者单位： | SVGLithography!Wilton，CT06897，SVGLithography!Wilton，CT06897，SVGLithography!Wilton，CT06897 |
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| 摘 要： | 提出了对现代光刻设备性能数据和系统预先筹划和配置 ,并在此基础上讨论了对关键性能方面进一步开发的方法和模式 ,同时还讨论了关于这些模式性能的支持分析结果。
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| 关 键 词： | 光刻 扫描曝光机 半导体 |
| 文章编号： | 1004-4507(2000)03-0044-08 |
| 修稿时间： | 2000-03-18 |
Synergistic evolution to production-worthy 30 nm Lithography |
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| Daniel R.Cote,James A.Mc Clay,Noreen Harned. Synergistic evolution to production-worthy 30 nm Lithography[J]. Equipment for Electronic Products Marufacturing, 2000, 29(3): 44-52 |
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| Authors: | Daniel R.Cote James A.Mc Clay Noreen Harned |
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| Affiliation: | SVG Lithography,Wilton,CT06897 |
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| Abstract: | The ever-increasing demand on circuit performance necessitates rapid deployment of optical lithographic as well as early production next generation lithographic tools.Successful execution of the multitude of development programs involved requires careful consideration and implementation of system architecture with special emphasis on program synergy and modularity. This paper presents performance data and system budgeting and bllocation for current generation lithographic tools,and building from that basis,discusses evolutionary approaches for critical performance areas and modules.Supporting analytical results regarding performance of these modules are also discussed. |
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