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离子钨钼共渗的扩散机制
引用本文:李成明,贺志勇,徐重.离子钨钼共渗的扩散机制[J].中国有色金属学报,2000,10(2):185-188.
作者姓名:李成明  贺志勇  徐重
作者单位:中国科学院力学研究所材料工程中心!北京100080(李成明),太原理工大学表面工程研究所!太原030024(贺志勇,徐重)
基金项目:山西省青年基金资助项目! 9710 17
摘    要:对双层辉光离子钨钼共渗在离子条件下形成的渗层和无离子形成的渗层进行了对比,计算了溶质原子钨和钙与空位的结合能。据溶质-空位复合体扩散的能量条件,提出溶质-空位复合体扩散机制在双层辉光离子钨钼共渗中起重要作用。由此解释了双了离子钨钼共渗的W和MO原子快速现象和渗后冷却中大量金属合物在晶界的析出。

关 键 词:离子轰击  钨钼共渗  溶质空位复合体  扩散
修稿时间:1999-05-26

Diffusion mechanism of ion bombardment W-Mo surface alloying
LI Cheng ming ,HE Zhi yong ,XU Zhong.Diffusion mechanism of ion bombardment W-Mo surface alloying[J].The Chinese Journal of Nonferrous Metals,2000,10(2):185-188.
Authors:LI Cheng ming  HE Zhi yong  XU Zhong
Affiliation:LI Cheng ming 1,HE Zhi yong 2,XU Zhong 2 1. Center of Material Engineering,Institute of Mechanics,Chinese Academy of Sciences,Beijing 100080,P.R.China, 2. Research Institute of Surface Engineering,Taiyuan University of Technology,Taiyua
Abstract:The W Mo alloy layers were obtained by double glow plasma surface alloying technique. The alloying results were compared between processing conditions: with or without ion bombardment on the surface of substrate. The binding energy of vacancy with the solute atoms of W and Mo was calculated. According to the energy condition of solute vacancy complex diffusion, the mechanism of solute vacancy diffusion played an important role in the double glow plasma surface alloying process. The results explained the high diffusion efficiency of W Mo atoms in the alloying process and gave the precipitation of large quantity of intermetallics at grain boundaries during the cooling process after the alloying treatment.
Keywords:ion bombardment  W-Mo surface alloying  solute-vacancy complex  diffusion
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