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Two-temperature technique for plasma-enhanced chemical vapour deposition growth of silicon-nitride on InP |
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| Authors: | J. Her H. Lim C. H. Kim I. K. Han J. I. Lee K. N. Kang J. E. Kim H. Y. Park |
| Affiliation: | (1) Department of Electronic Engineering, Ajou University, 441-749 Suwon, Korea;(2) Optical Electronics Laboratory, Korea Institute of Science and Technology, 130-650 Seoul, Korea;(3) Department of Physics, Korea Advanced Institute of Science and Technology, 305-701 Taejon, Korea |
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