Scaling dependence of electron transport in nano-scale Schottky barrier MOSFETs |
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Authors: | Shuichi Toriyama Nobuyuki Sano |
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Affiliation: | (1) Advanced LSI Technology Laboratory, Toshiba Corporation, 8, Shinsugita-cho, Yokohama 235-8522, Japan;(2) Institute of Applied Physics, University of Tsukuba, Tsukuba Ibaraki, 305-8573, Japan |
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Abstract: | The scaling dependence of electron transport in the double-gated Schottky barrier MOSFET (DG-SBT) below 10 nm is investigated in the framework of quantum transport theory, using non-equilibrium Green’s function method. Simulation results show that the current-voltage characteristics in ultra-small DG-SBT are characterized by both resonant and direct tunneling effects. The electron potential in the 10-nm-scale DG-SBT surrounded by Schottky barriers acts as a resonant cavity and produce a negative differential resistance due to resonant tunneling effect. While, further scaling shallows the depth of the cavity and makes it difficult to form resonance levels. Hence, at the scaling limit, direct tunneling currents simply dominate the current-voltage characteristics of DG-SBT. |
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Keywords: | Schottky barrier MOSFET Resonant tunneling Direct tunneling NEGF |
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