Soft lithography meets self-organization: Some new developments in meso-patterning |
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Authors: | Rabibrata Mukherjee Ashutosh Sharma Ganesh Patil Danish Faruqui Partho Sarathi Gooh Pattader |
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Affiliation: | (1) Department of Chemical Engineering, Indian Institute of Technology, Kanpur, 208 016, India;(2) Present address: Central Glass and Ceramic Research Institute, Kolkata, 700 032, India |
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Abstract: | This is a brief review of our recent and ongoing work on simple, rapid, room temperature, pressure-less and large area (∼
cm2) imprinting techniques for high fidelity meso-patterning of different types of polymer films. Examples include soft solid
polymer films and surfaces like cross-linked polydimethylsiloxane (PDMS) and polyacrylamide (PAA) based hydrogels, thermoplastics
like polystyrene (PS), polymethylmethacrylate (PMMA) etc both on planar and curved surfaces. These techniques address two
key issues in imprinting: (i) attainment of large area conformal contact with the stamp, especially on curved surfaces, and
(ii) ease of stamp detachment without damage to the imprinted structures. The key element of the method is the use of thin
and flexible patterned foils that readily and rapidly come into complete conformal contact with soft polymer surfaces because
of adhesive interfacial interactions. The conformal contact is established at all length scales by bending of the foil at
scales larger than the feature size, in conjunction with the spontaneous deformations of the film surface on the scale of
the features. Complex two-dimensional patterns could also be formed even by using a simple one-dimensional master by multiple
imprinting. The technique can be particularly useful for the bulk nano applications requiring routine fabrication of templates,
for example, in the study of confined chemistry phenomena, nanofluidics, bio-MEMS, micro-imprinting, optical coatings and
controlled dewetting. |
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Keywords: | Self-organization meso-patterning visco-elastic film imprinting adhesion soft lithography |
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