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Properties of (11-20) a-plane ZnO films on sapphire substrates grown at different temperatures by plasma-assisted molecular beam epitaxy
Authors:Seok Kyu HanSoon-Ku Hong  Jae Wook LeeJae Goo Kim  Myoungho JeongJeong Yong Lee  Sun Ig HongJin Sub Park  Young Eon IhmJun-Seok Ha  Takafumi Yao
Affiliation:
  • a Department of Advanced Materials Engineering, Chungnam National University, Daejeon 305-764, Republic of Korea
  • b Graduate School of Green Energy Technology, Chungnam National University, Daejeon 305-764, Republic of Korea
  • c Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
  • d Department of Electronic Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Republic of Korea
  • e School of Applied Chemical Engineering, Chonnam National University, Gwangju 505-757, Repulic of Korea
  • f Center for Interdisciplinary Research, Tohoku University, Sendai 980-8587, Japan
  • Abstract:
    Keywords:Molecular beam epitaxy   Thin film   Epitaxy   Zinc oxide   Nonpolar   Semiconductor
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