Investigation on deep level defects in rapid thermal annealed undoped n-type InP

Deep levels in rapid thermal annealed Pd/n-InP Schottky contacts have been studied using deep level transient spectroscopy. It is observed that the as-deposited Pd/n-InP Schottky sample exhibit two deep levels with activation energies of 0.53 and 0.70 eV. In samples annealed at 400 °C, three deep levels having activation energies 0.18, 0.30 and 0.86 eV below the conduction band are observed and for samples annealed at 500 °C, four deep levels with activation energies 0.33, 0.44, 0.70 and 0.82 eV are observed. Fourier transform infrared spectroscopy measurements have been carried out on undoped as-deposited and annealed InP wafers at 300, 400 and 500 °C. The measurements revealed high concentration of hydrogen complexes in the form of V_InH₄ existing in InP wafer. The results show that V_InH₄ complex annihilates with increase of annealing temperature and results in the formation of P _In ²⁺ and V _P ⁺ defects at 0.70 and 0.44 eV, respectively.