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全耗尽SOI MOSFETs阈值电压和电势分布的温度模型
引用本文:唐俊雄,唐明华,杨锋,张俊杰,周益春,郑学军.全耗尽SOI MOSFETs阈值电压和电势分布的温度模型[J].半导体学报,2008,29(1).
作者姓名:唐俊雄  唐明华  杨锋  张俊杰  周益春  郑学军
作者单位:湘潭大学材料与光电物理学院,低维材料及应用技术教育部重点实验室,湘潭,411105
基金项目:国家自然科学基金,国家自然科学基金,Key Project of Scientific and Technological Department of Hunan Province,Low Dimensional Materials & Application Technology (Xiangtan University) of the Ministry of Education of China
摘    要:提出了一个全耗尽SOI MOSFETs器件阈值电压和电势分布的温度模型.基于近似的抛物线电势分布模型,利用适当的边界条件对二维的泊松方程进行求解.同时利用阈值电压的定义得到了阈值电压的模型.该温度模型详细地研究了电势分布和阈值电压跟温度之间的变化关系,同时还近似地探讨了短沟道效应.为了进一步验证模型的正确性,利用SILVACO ATAS软件进行了相应的模拟.结果表明,模型计算与软件模拟吻合较好.

关 键 词:全耗尽SOI  MOSFETs  电势  阈值电压

A Temperature-Dependent Model for Threshold Voltage and Potential Distribution of Fully Depleted SOI MOSFETs
Tang Junxiong,Tang Minghua,Yang Feng,Zhang Junjie,Zhou Yichun,Zheng Xuejun.A Temperature-Dependent Model for Threshold Voltage and Potential Distribution of Fully Depleted SOI MOSFETs[J].Chinese Journal of Semiconductors,2008,29(1).
Authors:Tang Junxiong  Tang Minghua  Yang Feng  Zhang Junjie  Zhou Yichun  Zheng Xuejun
Abstract:A temperature-dependent model for threshold voltage and potential distribution of fully depleted silicon-on-insulator metal-oxide-semiconductor field-effect transistors is developed. The two-dimensional potential distribution function in the silicon thin film based on an approximate parabolic function has been applied to solve the two-dimensional Poisson's equation with suitable boundary conditions. The minimum of the surface potential is used to deduce the threshold voltage model. The model reveals the variations of potential distribution and threshold voltage with temperature, taking into account short-channel effects. Furthermore, the model is verified by the SILVACO ATLAS simulation. The calculations and the simulation agree well.
Keywords:fully depleted silicon-on-insulator MOSFETs  potential  threshold voltage
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