| DY－5型亚微米电子束曝光机多座标系重合的调校技术 |
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| 引用本文： | 武丰煜,唐文剑,张福安. DY－5型亚微米电子束曝光机多座标系重合的调校技术[J]. 电工电能新技术, 1994, 0(4) |
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| 作者姓名： | 武丰煜 唐文剑 张福安 |
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| 作者单位： | 中科院电工研究所 |
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| 摘 要： | 在电子束曝光机中，工件传动台、电磁偏转场及标记三者相对应的座标轴是否重合，是影响图形拼接精度的重要因素之一。本文概要地介绍了调校三座标系相互重合的方法，并给出了ＤＹ－５型亚微米电子束曝光机调校结果。
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| 关 键 词： | 电子束曝光机，微电子束 |
TECHNIOUE OF ADJUSTMENT AND CORRECTION OF POLY-COORDINATE SYSTEMS COINCIDENCEIN DY-5 MICRO-EBEM |
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| WU Fengyu,TANG Wenjian,ZHANG Fuan. TECHNIOUE OF ADJUSTMENT AND CORRECTION OF POLY-COORDINATE SYSTEMS COINCIDENCEIN DY-5 MICRO-EBEM[J]. Advanced Technology of Electrical Engineering and Energy, 1994, 0(4) |
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| Authors: | WU Fengyu TANG Wenjian ZHANG Fuan |
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| Abstract: | In electron beam exposure machines the coincidence of three correspon-ding coordinate systems of stage movement, electro-magnetic deflection andmark is one of the important factors which affect pattern stitching accu-racy. The paper introduced adjustment and correction methods of coincidingthe poly-coordinate systems, and gave adjustment and correction results ofDY-5 micro-EBEM. |
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| Keywords: | electron beam exposure machine micro-electron beam |
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