| 射频等离子体制备类金刚石薄膜及其表征 |
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| 引用本文： | 谢鹏,汪建华,王传新,王升高,满卫东,熊礼威. 射频等离子体制备类金刚石薄膜及其表征[J]. 武汉化工学院学报, 2009, 31(3): 60-63 |
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| 作者姓名： | 谢鹏 汪建华 王传新 王升高 满卫东 熊礼威 |
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| 作者单位： | [1]武汉工程大学材料学院,湖北武汉430074 [2]湖北省等离子体化学与新材料重点实验室,湖北武汉430074 |
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| 基金项目： | 国家自然科学基金（50572075）;湖北省教育厅2004年创新团队项目;湖北省教育厅Q20081505项目 |
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| 摘 要： | 采用射频等离子体技术，以CH4和H2为反应气体，在单晶硅片和载玻玻璃片上成功制备出了高质量的类金刚石薄膜．采用扫描电镜、原子力显微镜、Raman光谱、红外光谱、显微硬度计表征了类金刚石薄膜的表面形貌、微观结构、光学性能和复合硬度．结果表明，制备出的类金刚石薄膜表面十分平整光滑，表面粗糙度极低，平均粗糙度Ra为0．492nm；薄膜中含有sp^2，sp^3杂化键，具有典型的类金刚石结构特征；光学透过率比较高，薄膜的复合硬度可以高达507．3kgf／cm^2．
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| 关 键 词： | 射频等离子体 类金刚石薄膜 粗糙度 拉曼光谱 显微硬度 |
Preparation and characteristics of diamond-like carbon films prepared by RF-PECVD |
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| Affiliation: | XIE Peng ,WANG Jian-hua ,WANG Chuan-xin ,WANG Sheng-gao , MAN Wei-dong ,XIONG Li-wei ( 1. Wuhan Institute of Technology, School of Materials Science and Engineering, Wuhan 430074,China; 2. Provincial Key Laboratory of Plasma Chemistry and Advanced Materials,Wuhan 430074,China) |
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| Abstract: | Diamond-like carbon （DLC） films have been successfully grown on silicon wafer and glass slide substrates by radio frequency plasma enhanced chemical vapor deposition （RF-PECVD） in a H2/ CH4 plasma. Surface morphology, microstructure, optical properties and hardness of the films were investigated by Scanning Electron Microscopy （SEM）, Atomic Force Microscopy （AFM）, Raman Spectroscopy （Raman）,Infrared Spectrum （IR） and micro-hardness instrument. The result shows that the surface of the film is very flat and smooth and surface average roughness is 0. 429 nm. The film has sp2, sp3 bond and typical hydrogenated diamond-like characteristics. The film has high optical transparency; its hardness is up to 507.3 kgf/cm^2. |
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| Keywords: | RF-PECVD diamond-like carbon films roughness Raman spectroscopy micro-hardness |
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